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Electronics-Grade Ultrapure Water (UPW) Equipment for manufacturing semiconductors, microchips, and flat-panel displays.
جزئیات محصول:
| محل منبع: | چین |
| نام تجاری: | CHONGYANG |
| گواهی: | ISO ,CE |
| شماره مدل: | CY-UP -10000L/H |
پرداخت:
| مقدار حداقل تعداد سفارش: | 1 |
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| قیمت: | negotiable |
| جزئیات بسته بندی: | طبق استاندارد صادرات |
| زمان تحویل: | با 30-40 روز |
| شرایط پرداخت: | L/C، T/T |
| قابلیت ارائه: | 100 مجموعه در ماه |
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اطلاعات تکمیلی |
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| نام محصول: | کارخانه RO | ظرفیت: | 10000L/H-100000L/H |
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| مواد: | فولاد ضد زنگ 304، 316L UPVC | غشای: | دو RO، RO تک |
| مخزن آب: | مخزن آب خام، مخزن آب RO، مخزن آب میانی | درمان Pr: | فیلتر چند رسانه ای، فیلتر کربن فعال، نرم کننده |
| مارک پمپ: | Grundfos، CNP | مواد مسکن RO: | SS، FRP |
| مقاومت: | 18.2 MΩ · سانتی متر | دریچه: | دریچه |
توضیحات محصول
Detailed Specifications for Electronics-Grade Ultrapure Water (UPW) Equipment
Electronics-grade Ultrapure Water (UPW) equipment is designed to produce water of the highest purity, critical for manufacturing semiconductors, microchips, and flat-panel displays. The system must reliably achieve a resistivity of 18.2 MΩ·cm at 25°C and have extremely low levels of ions, particles, bacteria, and Total Organic Carbon (TOC).
1. Capacity (Flow Rate)
The flow rate of a UPW system is highly customizable based on the fab’s requirements. Systems are typically sized by their hourly or daily production capacity.
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Standard Range:
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Recirculation Flow: 50 m³/h – 200 m³/h (220 – 880 GPM)
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Make-up Flow: 10 m³/h – 100 m³/h (44 – 440 GPM)
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2. Key Specifications
| Parameter | Specification | Purpose / Rationale |
|---|---|---|
| Final Water Quality | ||
| Resistivity | 18.2 MΩ·cm at 25°C | Measures ionic purity. The theoretical maximum. |
| TOC (Total Organic Carbon) | < 1 ppb (μg/L) | Prevents organic contamination on wafers. |
| Particle Count (≥ 0.05 μm) | < 100 / liter | Eliminates defects in nanoscale circuits. |
| Silica (SiO₂) | < 0.1 ppb | Preforms insulating oxide layers. |
| Bacteria | < 0.01 CFU/mL | Prevents biofilms and microbial contamination. |
| System Components | ||
| Pretreatment | Multi-media filters, Carbon filters, Softeners | Removes suspended solids, chlorine, and organics. |
| Primary Purification | Double-Pass RO (Reverse Osmosis) | Removes >99% of dissolved salts and organics. |
| Polishing | EDI (Electrodeionization) | Continuous, chemical-free removal of residual ions. |
| Final Polish | UV Lamp (185nm & 254nm), Polishing Mixed Bed DI | 185nm UV oxidizes organics; final polishing ensures 18.2 MΩ·cm. |
| Distribution | Continuous Recirculation Loop with 0.1 μm Filters | Maintains purity at point of use and prevents bacterial regrowth. |
3. Materials of Construction
The choice of materials is critical to prevent the system itself from becoming a source of contamination.
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Piping & Fittings: PVDF (Polyvinylidene Fluoride) is the industry standard for the high-purity loop. 316L Stainless Steel (Electropolished, Low Carbon) is used for tanks and some pretreatment components.
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Valves: PVDF Diaphragm Valves or PP (Polypropylene) Valves are standard to minimize dead legs and contamination.
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Pumps: Stainless Steel (316L) with high-quality seals.
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Instrumentation: All wetted parts must be compatible (e.g., PVDF, PFA, 316L SS) to avoid leaching.
4. Power Consumption
The power requirement is significant and varies greatly with the system’s capacity. Major power consumers are high-pressure RO pumps and UV lamps.
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Typical Range: 50 kW – 500 kW
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A small system (10 m³/h) may require ~50-100 kW.
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A large system (100 m³/h) can require 300-500 kW or more.
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Summary:
An 18.2 MΩ·cm Ultrapure Water System is a complex, multi-stage purification train. Its specifications—from the high flow rates and extreme water quality parameters to the inert PVDF materials and substantial power needs—are all engineered to meet the uncompromising purity demands of the electronics industry, ensuring high manufacturing yields and product performance.
